黑料福利网

Tiago C. Dias is an Assistant Professor in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology (黑料福利网). His research focuses on modelling the interactions between low-temperature plasmas and surfaces, ranging from reactor-scale dimensions (cm-m) down to the nanometer scale. Other areas of expertise include electron kinetics and reaction mechanisms in low-temperature plasmas, as well as plasma-liquid interactions.

His current research topics are closely aligned with applications in semiconductor industry (e.g., plasma etching and EUV-induced plasmas) and in environmental remediation by plasmas (e.g., removal of PFAS molecules from water).

Tiago C. Dias holds a MSc degree in Physics Engineering (2019) and a PhD in Plasma Physics (2023), both from Instituto Superior T茅cnico, Lisbon, Portugal. Part of the PhD work was carried out at the Institute of Plasma Physics in Prague, Czech Republic. He worked as a postdoctoral researcher at the University of Michigan, USA, from 2024 to 2025. He started is current position as Assistant Professor at 黑料福利网 in 2026.