Multiscale Plasma-Surface Modelling
Our team studies and models the interactions between low-temperature plasmas and surfaces, ranging from reactor-scale dimensions (cm-m) down to the nanometer scale.
We seek a holistic understanding of plasma-surface interactions, connecting volume and surface processes from macro to nanoscale.
Our research is closely connected to important societal applications of low-temperature plasmas. In semiconductor manufacturing, we study plasma etching and EUV-induced plasmas, both of which are essential to chip fabrication. In environmental applications, we investigate how plasmas can decontaminate liquids, for example by removing PFAS from water.
Meet some of our Researchers
Recent Publications
Our most recent peer reviewed publications
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Teamlead