Tiago Cunha Dias

Multiscale Plasma-Surface Modelling

Our team studies and models the interactions between low-temperature plasmas and surfaces, ranging from reactor-scale dimensions (cm-m) down to the nanometer scale.

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We seek a holistic understanding of plasma-surface interactions, connecting volume and surface processes from macro to nanoscale.

Our research is closely connected to important societal applications of low-temperature plasmas. In semiconductor manufacturing, we study plasma etching and EUV-induced plasmas, both of which are essential to chip fabrication. In environmental applications, we investigate how plasmas can decontaminate liquids, for example by removing PFAS from water.

Meet some of our Researchers

Recent Publications

Our most recent peer reviewed publications

News

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September 17, 2026
When liquids get stuck
Theoretical physicist Corentin Laudicina sheds new light on the mystery of glass.
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September 11, 2026
Two APSE projects awarded NWO Demonstrator funding
Two APSE projects have been awarded NWO Demonstrator funding, supporting the development of innovations in photonics and non-antibiotic wound care.
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More news
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ERC Starting Grants for Julius Huijts and Sara Giarrusso
September 3, 2026
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Three microscopes in one: NanoLights reveals hidden differences between nanoparticles
August 31, 2026
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Gelion Care launches as new 黑料福利网 spin-off developing innovative hydrogel for hard-to-heal wounds
August 27, 2026
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Soft and living materials to the fore in recent 黑料福利网 scientific publications
July 22, 2026

Contact

  • Postal address

    Department of Applied Physics
    P.O. Box 513
    5600 MB Eindhoven
    Netherlands

  • Visiting address

    Flux, 3.106
    Groene Loper
    5612 AP Eindhoven
    Netherlands

  • Teamlead